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• 10:55, 1 June 2015 Bghe talk contribs deleted page Specific Process Knowledge/E-beam lithography/SAL601 (content was: "SAL601 is a negative tone, chemical amplified e-beam resist. It has good sensitivity (80µc/cm² at 100kV). the resolution is around 100nm. Develope: *MF322: 5 to 8 min *Rinse by DI water: 30 sec")