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• 10:54, 1 June 2015 Bghe talk contribs deleted page Specific Process Knowledge/E-beam lithography/Develop e-beam resist (content was: "===Zep520A develop=== Standard recipe for developing: # N50, 2min for develop # IPA 30sec for rinse # N₂ blow dry or spin dry Note: Zep520A have a large tolerance on development time. for the resist thickness less than 150 n...")