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• 10:53, 1 June 2015 Bghe talk contribs deleted page Specific Process Knowledge/E-beam lithography/What resist to choose (content was: "===Positive tone resist=== ZEP520A is the most popular used E-beam resist. It is a positive resist with high resolution (better than 30nm). If you need a negative tone pattern, the normal procedure is to use the lift-off process( with ...")