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• 09:09, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/III-V Process/etch/plasys/Specific Process Knowledge/III-V Process/etch/plasys/III V RIE ETCHES (content was: "==test1== A plasma with a gas mixture of CHF<math>_3</math> and O<math>_2</math> is used to etch SiO<math>_2</math> and Si<math>_3</math>Ni<math>_4</math> dielectricas; fl..." (and the only contributor was "Tg"))