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• 08:24, 23 April 2014 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD/deposition rate for STOxide (content was: "Deposition rate as a function of deposition time: Measurements done: {| border="2" cellspacing="1" cellpadding="8" |- | Deposition time [s] |Oxide thickness [nm] |Expect..." (and the only contributor was "BGE"))