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• 11:40, 29 April 2011 Jml talk contribs uploaded File:WF 2E07a mar23 2011-030.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.4 recipe, Run ID 2000, time 120 secs, SF6 38, C4F8 75, 4mtorr, 800/50 coil/platen, -20 degs.)