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- 18:48, 13 October 2026 Eves talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Vanadium Silicide/V3Si RF-DC Co-Sputtering in Cluster Lesker PC3 (Created page with "<i>This page is written by <b>Evgeniy Shkondin @ DTU Nanolab</b> if nothing else is stated.<br> All images and data on this page belong to <b>DTU Nanolab</b>.<br> The exploratory deposition and characterization described below were performed in <b>2025</b>.<br></i> =Exploratory V-Si RF-DC co-sputtering in Cluster Lesker PC3= This page documents an early, non-systematic attempt to deposit vanadium silicide by simultaneous RF sputtering of a 4-inch Si target and DC sputt...")