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• 14:01, 30 March 2011 Jml talk contribs uploaded File:WF 2E01 mar23 2011 090b.jpg (Etching of nanostructures in Si using DRIE-Pegasus: nano1.3 recipe, Run ID 1856 (a) and 1857 (a+b), time 60 secs (a) and 120 secs (b), SF6 38, C4F8 52, 4mtorr, 600/40 coil/platen, -10 degs.)