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• 11:43, 18 March 2011 Jml talk contribs uploaded File:WF 2C2 feb2011-150.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.3 recipe, Run ID 444, time 300 secs, BCl3 5, HBr 15, 2mtorr, 900/75 coil/platen, 20 degs.)