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• 12:28, 14 April 2026 Mmat talk contribs deleted page Specific Process Knowledge/Lithography/EBeamLithographyManual (content before blanking was: "= Purpose, location and technical specifications = The JEOL JBX-9500FS electron beam lithography system is a spot electron beam lithography system designed for use in writing patterns with dimensions from nanometers to sub-micrometers. Substrates that needs e-beam exposure should be mounted in a cassette and transferred into the writer via the robot loader (autoloader). To request for an e-beam training session, contact e-beam@nanolab.dtu.dk; a DTU Nanolab...")