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• 10:53, 7 November 2025 Pevo talk contribs created page Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Phosphorous doped poly-Si (Created page with "THIS PAGE IS UNDER CONSTRUCTION {{cc-nanolab}} '''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Thin_film_deposition/Furnace_LPCVD_PolySilicon/Boron_doped_poly-Si_and_a-Si click here]''' ==Boron-doped amorphous silicon by using 4" LPCVD polysilicon furnace (B4) == ''Result from Thomas Pedersen, DTU Nanotech (now DTU Nanolab), September 2015'' ===...")