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• 14:52, 15 March 2011 Jml talk contribs uploaded File:WF2B-6-feb06-2011-090nm.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.6 recipe, Run ID 441 and 442, time 180 secs, Cl2 15, BCl3 5, 2mtorr, 900/60 coil/platen, 20 degs.)