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• 14:45, 15 March 2011 Jml talk contribs uploaded File:WF 2B3 feb06 2011-060.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano3.2 recipe, Run ID 426 and 428, time 120 secs, BCl3 5, HBr 15, 2mtorr, 900/60 coil/platen, 20 degs.)