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• 13:38, 7 March 2011 Jml talk contribs uploaded File:WF 2A-5 feb06 2011-030.jpg (Etching of nanostructures in Si using the ICP metal etcher: Sinano4.0 recipe, Run ID 435 and 436, time 90 secs, Cl2 20, 2mtorr, 900/60 coil/platen, 20 degs.)