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• 10:40, 14 December 2023 Mfarin talk contribs created page Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/tests CHF3+H2 (Created page with "===Recipes and results - <span style="background:#FFD850">CHF₃ tests=== {| border="1" cellspacing="1" cellpadding="1" align="left" ! '''Recipe''' ! '''Recipe parameters''' ! '''Process time''' ! '''Date''' ! '''SEM picture''' ! '''SEM pic w/ no resist''' ! '''Redeposition - top view''' ! '''Profile angles''' ! '''Etch rate in SiO2''' ! '''Etch rate in resist <br> (AZ5214E inverse)''' ! '''Selectivity <br> (SiO2:resist)''' ! '''Etch rate in Si''' |- |- |-sty...")