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• 15:37, 19 July 2023 Mfarin talk contribs created page Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using ASE/Unstable recipes - SiO2 etch (Created page with "=SiO2 etch with resist mask on wafer with clamping and He backside cooling= {{CC-bghe2}}, ''May 2018'' The ASE is now the "dirty" plasma etcher at Nanolab meaning small amount of metals are allowed to be exposed by the plasma. That calls for recipes etching Silicon oxide and silicon nitride as well as silicon in this machine. Not a lot experiments have been done yet etching SiO2 on wafers that are clamped and cooled but here is the best result so fare. <span style="b...")