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• 13:14, 8 April 2023 Thope talk contribs created page Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep (Created page with "=== Resist coating === An appropriate EBL resist must naturally be applied to the substrate. DTU Nanolab supplies a number of standard resists, please consult the table below. The default positive EBL resist is AR-P 6200.09 (CSAR). CSAR installed on Spin Coater: Gamma E-beam and UV for spin coating of 2", 4" and 6" substrates. For other substrate sizes (i.e. chips) or other resists Spec...")