All public logs

Combined display of all available logs of LabAdviser. You can narrow down the view by selecting a log type, the username (case-sensitive), or the affected page (also case-sensitive).

• 13:13, 8 April 2023 Thope talk contribs created page Specific Process Knowledge/Lithography/EBL/EBLsubstratePrep (Created page with "=== Resist coating === An appropriate EBL resist must naturally be applied to the substrate. DTU Nanolab supplies a number of standard resists, please consult the table below. The default positive EBL resist is AR-P 6200.09 (CSAR). CSAR installed on Spin Coater: Gamma E-beam and UV for spin coating of 2", 4" and 6" substrates. For other substrate sizes (i.e. chips) or other resists Spec...")