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• 14:20, 6 February 2023 Bghe talk contribs deleted page Specific Process Knowledge/Etch/Etching of Silicon Oxide/SiO2 etch using RIE1 or RIE2/Images of 1SiO2mSi with p-Si mask (content was: "'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Silicon_Oxide/SiO2_etch_using_RIE1_or_RIE2/Images_of_1SiO2mSi_with_p-Si_mask click here]''' =<span style="color:#FF0000"> Both RIE's (RIE1 and RIE2) for silicon based etching has been decommissioned </span> = ==This work was done on RIE1 which has been decommissioned but we expect the result...")