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- 18:48, 4 January 2023 Eves talk contribs created page Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Sputtering of Cr in Cluster Lesker PC1 (Created page with "This page presents the results of Cr deposition using DC sputtering in Sputter-System Metal-Oxide(PC1), now commonly known as "Cluster Lesker". The deposition target is Cr 3-inch. Source #3 (DC - HSM) was used. Cr is of particular interest in the dry etch as it serves as a durable hard mask in the quest to go beyond an aspect ratio of 100 in Si etching. Many users combines deposition of Cr with RF sputtering of Si to build the CrSi bilayer structure that acts as a hard...")