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• 12:54, 22 October 2010 Tg talk contribs deleted page Specific Process Knowledge/III-V Process/etch/plasys/Specific Process Knowledge/III-V Process/etch/plasys/CHF3 O2 RIE (content was: '== CHF<math>_3</math> / O<math>_2</math> etch== A plasma with a gas mixture of CHF<math>_3</math> and O<math>_2</math> is used to etch SiO<math>_2</math> and Si<math>_3</m...' (and the only contributor was 'Tg'))