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- 14:15, 18 June 2020 Bghe talk contribs deleted page Specific Process Knowledge/Thin film deposition/ALD Picosun R200/AlN deposition using ALD2/Acceptance test AlN (content was: "==AlN with N<sub>2</sub> plasma== <!-- Experiment 161102A --> The test was done with 300 cycles at 350 °C where the growth rate was measured to be '''0.0625 nm/cycl..." (and the only contributor was "Eves"))