Specific Process Knowledge/Thin film deposition/Deposition of Titanium

Titanium can be deposited by e-beam evaporation. In the chart below you can compare the different deposition equipment.

	E-beam evaporation (Alcatel)	E-beam evaporation (Wordentec)	E-beam evaporation (PVD co-sputter/evaporation)	Sputter deposition (Wordentec)
Batch size	Up to 1x4" wafers smaller pieces	24x2" wafers or 6x4" wafers or 6x6" wafers	4x6" wafers or 4x4" wafers or 4x2" wafers	24x2" wafers or 6x4" wafers or 6x6" wafers
Pre-clean	RF Ar clean	RF Ar clean	RF Ar clean	RF Ar clean
Layer thickness	10Å to 1µm	10Å to 1 µm	10Å to 1000Å	.
Deposition rate	2Å/s to 15Å/s	10Å/s to 15Å/s	About 1Å/s	Depending on process parameters, see here.

Comments: Choise of equipment