Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy
The Scanning Electron Microscopes at Danchip
At the moment we have three SEM's. Together they cover a wide range of needs in the cleanroom: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication.
The SEM that will cover most users needs is the Leo SEM. It is very reliable and rugged instrument that provides high quality images of most samples. Due to its robustness new users only need a mandatory two hour training session before they are free to use it by themselves. It is a standard high vacuum instrument equipped with a field emission gun, 3 high vacuum electron detectors (Se2, Inlens and RBSD) and a Röntec EDX system.