Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide

From LabAdviser
Revision as of 13:37, 30 November 2012 by BGE (talk | contribs) (Created page with "==Deposition of Titanium Oxide== Titanium oxide can be deposited only by sputter technique. At the moment the only system where we have a target for Titanium oxide is [[Specif...")
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

Deposition of Titanium Oxide

Titanium oxide can be deposited only by sputter technique. At the moment the only system where we have a target for Titanium oxide is IBE/IBSD Ionfab300. The target is Ti. During the sputter deposition oxygen is added to the chamber resulting in Titanium oxide on the sample.