Specific Process Knowledge/Thermal Process/C1 Furnace Anneal-oxide

C1 Anneal-oxide furnace

C1 Furnace Anneal-oxide. Positioned in cleanroom 2

The C1 Anneal-oxide furnace is a Tempress horizontal furnace for oxidation and annealing of silicon wafers, e.g with layers of oxide, polysilicon or BPSG glass (from PECVD1). Both 100 mm and 150 mm wafers can be processed in the furnace.

C1 is the upper furnace tube in the furnace C-stack positioned in cleanroom 2. In this furnace it is allowed to process wafers that comes directly from the A and B stack furnace or from PECVD1. Check the cross contamination chart.

The user manual, technical information and contact information can be found in LabManager:

Furnace C1: Anneal-oxide

Process knowledge

Oxidation: look at the Oxidation page
Annealing: look at the Annealing page

Overview of the performance of Anneal Oxide furnace and some process related parameters

Purpose	Oxidation and annealing	Oxidation: Dry Wet: with bubbler (water steam + N₂)
Performance	Film thickness	Dry SiO₂: 50Å to ~2000Å (takes too long to make it thicker) Wet SiO₂: 50Å to ~5µm ((takes too long to make it thicker)
Process parameter range	Process Temperature	800-1150 ^oC
	Process pressure	1 atm
	Gas flows	Annealing: N₂:5 sccm Dry oxidation: O₂:5 sccm Wet oxidation: N₂:5 sccm
Substrates	Batch size	1-30 4" and 6" wafer (or 2" wafers) per run
Substrates	Substrate material allowed	Silicon wafers (new from the box or RCA cleaned) Silicon wafers with layers of silicon oxide or silicon (oxy)nitride (RCA cleaned) Quartz wafers (RCA cleaned) From PECVD1 directly (assuming they fulfilled the above before entering the PECVD1)