Specific Process Knowledge/Thermal Process/Jipelec RTP

Jipelec - Rapid Thermal Processing

Jipelec RTP: Positioned in cleanroom 1

The Jipelec is a rapid thermal processing oven. It should be used for fast and well-controlled annealing or alloying of samples. It is possible to use a pyrometer to control the temperature (of the carrier).

Process parameter ranges	Process Temperature	0-1000 degree Celsius
	Process pressure	atmosphere pressure vacuum
Performance	Substrate material allowed	Silicon Silicon oxides Silicon nitrides Quartz Polysilicon Titan III-V materials (on graphite carrier)
	Allowed materials on substrate