Specific Process Knowledge/Thin film deposition/Si sputter in Wordentec

From LabAdviser

Silicon sputter

Silicon can be deposited in Wordentec.


Parameters

Listed below are tried parameters, that can be used during deposition.


Please don´t use higher power then 180W, since the target then could breake into a lot of small pieces.

Setting
Process type Sputtering
Power 130W
Sputter pressure 5*10-2
Rate About 0,6Å/s