Specific Process Knowledge/Thin film deposition/Si sputter in Wordentec
Silicon sputter
Silicon can be deposited in Wordentec.
Parameters
Listed below are tried parameters, that can be used during deposition.
Please don´t use higher power then 180W, since the target then could breake into a lot of small pieces.
Setting | |
---|---|
Process type | Sputtering |
Power | 130W |
Sputter pressure | 5*10-2 |
Rate | About 0,6Å/s |