Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617

AR-P 617 is a positive PMMA based E-beam resist from Allresist. Process information provided by Allresist can be found here.

Spin coating

AR-P 617 can be spin coated on LabSpin 2 and 3 using the CSAR/PMMA bowlset. A spin curve for AR-P 617.06 is provided below. Process parameters are:

• Date: January 22nd 2024
• Coater: LabSpin 3
• Substrate: 2" Si
• Acceleration: 1000 RPM/s
• Time: 60 s
• Baking temperature: 200C (setpoint at 222C)
• Baking time: 120 s

AR-P 617.06 spin curve.

Resulting resist thickness can be determined as y = ax^b+c, where y is thickness [nm], x is spin speed [RPM], a = 65274, b = -0.748 and c = 163.1.

Contrast curve

A contrast curve for AR-P 617.06 is provided below based on exposure at 100 kV for doses from 2.5 to 200 µC/cm². The dose clear is dependent on softbake temperature, in this case 200C and 180C is used. Process parameters are:

• Date: February 5th 2024
• Coater: LabSpin 2
• Substrate: 2" Si
• Acceleration: 1000 RPM/s
• Time: 60 s
• Baking temperature: 200C, 180C and 160C
• Baking time: 120 s
• Exposure: 100 kV (JEOL 9500)
• Development: AR 600-50 for 90 seconds
• Stopper: IPA for 30 seconds + blow dry with nitrogen

AR-P 617.06 contrast curve.