Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD02

From LabAdviser



Process runs
Date Substrate Information Process Information SEM Images
Wafer info Mask Material/ Exposed area Tool / Operator Conditioning Recipe Wafer ID Comments
2/12-2014 4" Wafer with travka50 mask AZ standard Si / 50 % Pegasus/jmli 10 minute TDESC clean nanolab/jml/showerhead/prD/PrD02, 110 cyc or 6:25 mins S004693 New showerhead