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Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD02

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< Specific Process Knowledge‎ | Etch‎ | DRIE-Pegasus‎ | showerheadchange

Revision as of 22:27, 25 November 2019 by Jmli (talk | contribs)

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**Process runs**
Date	Substrate Information				Process Information				SEM Images
Date	Wafer info	Mask	Material/ Exposed area	Tool / Operator	Conditioning	Recipe	Wafer ID	Comments	SEM Images
2/12-2014	4" Wafer with travka50 mask	AZ standard	Si / 50 %	Pegasus/jmli	10 minute TDESC clean	nanolab/jml/showerhead/prD/PrD02, 110 cyc or 6:25 mins	S004693	New showerhead

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