Specific Process Knowledge/Lithography/EBeamLithography/eLINE
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Process information for the Raith eLINE Plus system
Table of dose to clear on Si substrate:
| Dose [µC/cm2] | AR-P 6200.09 (180 nm) | PMMA 950k | AR-N 8200.xx |
|---|---|---|---|
| 10 kV | 30 | ||
| 20 kV | 70 | ||
| 30 kV | 100 |