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This page lists the chemicals that are made available in the cleanroom by Nanolab, covered by the cleanroom access hourly rate.

Acids, bases, and etchants

Ammonia solution 28%
Ammonium persulphate (Powder)
BHF (Mixture of Ammonium fluoride, Ammonium bi fluoride, Hydroflouric acid)
BOE 7:1 without surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid)
BOE 7:1 with surfactant (Mixture of Ammonium fluoride, Ammonium bifluoride, Hydroflouric acid)
Boric acid
Chrome ETCH 18 (Mixture of Ceric ammonium nitrate, Perchloric acid, Nitric acid)
HF 5%
HF 40%
Hydrochloric acid 37%
Hydrogen peroxide 31%
Nitric acid 69%
Phosphoric acid 85%
Potassium hydroxide (Pellets)
Potassium hydroxide 50%
Sulfamic acid
Sulfuric acid 96%

Developers

AR 600-546 (Amyl acetate)
AZ 351B (NaOH based with disodium tetraborate buffer)
AZ 726 MIF (TMAH based with surfactants added for fast and homogeneous substrate wetting)
mr-Dev 600 (PGMEA)
ZED-N50 (n-Amylacetate)