LabAdviser/314/Microscopy 314-307/SEM

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SEM

Scanning Electron Microscopy (SEM) is a technique, where a focussed beam of accelerated electrons is scanning over a sample. Electrons which are backscattered or secondar generated electrons are collected on a detector. Dependenging on the type of detector, different signals and sample characteristics can be acquired. The electron beam is steered by electromagnetic lenses.


We have three SEMs available at DTU Nanolab. Click on the instrument to find more information about the equipment and available techniques:

AFEG AFEG QFEG QFEG Nova Nova


Comparison between SEMs at DTU Nanolab - building 314/307

Equipment Nova QFEG AFEG Helios
Purpose
  • Conductive samples in High Vac
  • Charge reduction in Low Vac
  • X Ray Analysis with EDS
  • Crystallographic analysis using EBSD and both On and Off axis TKD
  • In-situ experiments with Heating and Gas injection
  • Conductive samples in High Vac
  • Charge reduction in Low Vac
  • Environmental control using Peltier stage
  • Cryogenic sample fixing/stabilization using cryo stage
  • X Ray Analysis with EDS
  • Conductive samples in High Vac
  • Charge reduction in Low Vac
  • X Ray Analysis with EDS and WDS
  • Conductive samples in High Vac
  • Micro and Nano milling/fabrication using various gases and FIB
  • X Ray Analysis with EDS
  • Crystallographic analysis using EBSD and Off Axis TKD
Equipment position Building 314 Room 060 Building 314 Room 011 Building 314 Room 034 Building 314 Room 061
Resolution The resolution of a SEM is strongly dependent on sample type and the operator. Resolution quoted is using sputtered gold on carbon
  • High Vacuum operation in Mode II:
    • 1.0 nm at 15 kV (TLD detector and optimum working distance)
    • 1.8 nm at 1 kV (TLD detector and optimum working distance)
  • Low Vacuum operation in Mode II:
    • 1.5 nm at 10 kV (Helix detector and optimum working distance)
    • 1.8 nm at 3 kV (Helix detector and optimum working distance)
  • High vacuum
    • 0.8 nm at 30 kV (STEM)
    • 1.0 nm at 30 kV (SE)
    • 2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE)
  • High vacuum with beam deceleration option
    • 3.0 nm at 1 kV (BD mode + BSE)
  • Low vacuum - 1.4 nm at 30 kV (SE)
    • 2.5 nm at 30 kV (BSE)
    • 3.0 nm at 3 kV (SE)
  • Extended vacuum mode (ESEM)
    • 1.4 nm at 30 kV (SE)
  • High vacuum
    • 0.8 nm at 30 kV (STEM)
    • 1.0 nm at 30 kV (SE)
    • 2.5 nm at 30 kV (BSE) - 3.0 nm at 1 kV (SE)
  • High vacuum with beam deceleration option
    • 3.0 nm at 1 kV (BD mode + BSE)
  • Low vacuum - 1.4 nm at 30 kV (SE)
    • 2.5 nm at 30 kV (BSE)
    • 3.0 nm at 3 kV (SE)
  • Electron Column Operation in Mode II
    • 0.8nm @15kV
    • 0.9nm @1kV
  • Ion Column
    • 4.5nm @ 30kV
Detectors
  • ETD/TLD Secondary Electrons
  • BSED Back Scatter Electrons
  • LVD/LFD Low Vac SE
  • Helix Low Vac SE
  • EDS X Ray by energy
  • EBSD Electron Back Scatter Diffraction
  • TKD Transmission Kikuchi Diffraction
  • STEM Scanning Transmission Electron Microscopy
  • GAD Low Vac BSED
  • ETD Secondary Electrons
  • BSED Back Scatter Electrons
  • LVD/LFD Low Vac SE
  • GSED ESEM SE
  • EDS X Ray by energy
  • STEM Scanning Transmission Electron Microscopy
  • ETD Secondary Electrons
  • BSED Back Scatter Electrons
  • LVD/LFD Low Vac SE
  • GSED ESEM SE
  • EDS X Ray by energy
  • STEM Scanning Transmission Electron Microscopy
  • ETD/TLD Secondary Electrons
  • ABS Annular BSED
  • EDS X Ray by energy
  • EBSD Electron Back Scatter Diffraction
  • CDEM Continuos Dinode Electron Multiplier
Stage specifications
  • X 150mm Piezo
  • Y 150mm Piezo
  • Z 10mm
  • R 360⁰ Piezo
  • T 70⁰
  • X 50mm
  • Y 50mm
  • Z 50mm
  • R 360⁰
  • T 70⁰ Manual
  • X 50mm
  • Y 50mm
  • Z 50mm
  • R 360⁰
  • T 70⁰ Manual
  • X 150mm Piezo
  • Y 150mm Piezo
  • Z 10mm
  • R 360⁰ Piezo
  • T 70⁰
Options B C D E
Max sample size Consult with DTU Nanolab staff as weight, dimensions, pumping capacity and technique all play a roll in the sample size



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