Specific Process Knowledge/Etch/DRIE-Pegasus/Isotropic/Isoslow7

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< Specific Process Knowledge‎ | Etch‎ | DRIE-Pegasus‎ | Isotropic
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Process runs
Date Substrate Information Process Information SEM Images
Wafer info Mask Material/ Exposed area Tool / Operator Conditioning Recipe Wafer ID Comments
28/2-2014 4" travka50 wafer 1.5 µm AZ Si / 50 % Pegasus/jmli 1 minute TDESC clean + MU runs jml/isotropic/isoslow7 1:00 minutes S003900 Bottom fine!!

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