Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing

From LabAdviser

Feedback to this page: click here

General Process Information

Exposure dose

The exposure dose needed inn the Aligner: Maskless 01 seems to follow the dose needed to process the same substrate in KS Aligner. As doses get higher, there is a tendency for the dose needed in the Aligner: Maskless 01 to exceed the dose needed in KS Aligner.

Defocus

The optimal defocus setting is probable a function of the resist thickness, but for 1.5µm resist, a defocus of -4 seems to be optimal.

Substrate positionning

Substrate centering

Flat alignment

Alignment

Stitching

Overlay

Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_01_processing&oldid=27656"