Specific Process Knowledge/Etch/DRIE-Pegasus/Isotropic

From LabAdviser
< Specific Process Knowledge‎ | Etch‎ | DRIE-Pegasus
Revision as of 13:39, 2 June 2016 by Jmli (talk | contribs) (Created page with "{| border="1" cellpadding="1" cellspacing="0" style="text-align:center;" |+ '''Mediumiso''' |- ! rowspan="2" width="100"| Recipe ! rowspan="2" width="20"| Step ! rowspan="2" w...")
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Mediumiso
Recipe Step Temp. Deposition step Etch step Process observations
Time Pres. C4F8 SF6 O2 Coil Time Pres. C4F8 SF6 O2 Coil Platen HW Runs Key words
mediumiso1 - 20 NA NA NA NA NA NA NA 25 0 150 0 600 3 - 1 NA
-
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/Isotropic&oldid=23782"