Specific Process Knowledge/Characterization/SEM Supra 1
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SEM Supra 1
The SEM Supra 1 a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation.
The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the HV detectors will no longer work.
The SEM is the training SEM at DTU Danchip. It means that all new SEM users with no and little SEM experience much be trained on this tool and gain basic knowledge (typically 10 hours of usage) here before being qualified for training on other SEM's.
The SEM Supra 1 (formerly known as SEM Zeiss) has been relocated to the basement with two purposes: Serving the users that have samples from outside the cleanroom and serving as training tool; all new SEM users with no/little SEM experience must be trained on this tool and gain basic knowledge (typically 10 hours of usage) here before being qualified for training on other SEM's.
The SEM is located in basement outside the cleanroom. The Balzer Sputter is located in the same room and can be used to cover samples (for instance polymer samples from the Polymer Injection Molding tool) with a thin gold layer before SEM inspection.
The SEM LEO was installed in the cleanroom in the 1998, and the software was ungraded in 2012.
The user manual, control instruction, the user APV and contact information can be found in LabManager:
SEM Supra 1 info page in LabManager,
Performance information
Equipment performance
Equipment | SEM Supra 1 (Supra 40VP SEM) | |
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Purpose | Imaging and measurement of |
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Location |
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Performance | Resolution |
The resolution is strongly dependent on the type of sample and the skills of the operator. |
Instrument specifics | Detectors |
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Stage |
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Electron source |
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Operating pressures |
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Options |
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Substrates | Batch size |
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Allowed materials |
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