Specific Process Knowledge/Characterization/SEM Supra 3

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The SEM Supra 3

SEM Supra 3

The SEM Supra 1 a scanning electron microscope. It produces enlarged images of a variety of specimens, achieving magnifications of over 500.000x providing ultra high resolution imaging. This important and widely used analytical tool provides exceptional resolution and depth of field and requires minimal specimen preparation.

The SEM is a VP (variable pressure) instrument - Indicating that it is capable of operating at variable pressure. By increasing the pressure in the chamber it is possible to image isolating samples. The higher density of gas molecules will eliminate the charges at the cost of slightly reduced resolution. Also, the HV detectors will no longer work.

The SEM is the training SEM at DTU Danchip. It means that all new SEM users with no and little SEM experience much be trained on this tool and gain basic knowledge (typically 10 hours of usage) here before being qualified for training on other SEM's.

The SEM Supra 1 (formerly known as SEM Zeiss) has been relocated to the basement with two purposes: Serving the users that have samples from outside the cleanroom and serving as training tool; all new SEM users with no/little SEM experience must be trained on this tool and gain basic knowledge (typically 10 hours of usage) here before being qualified for training on other SEM's.

The SEM is located in basement outside the cleanroom. The Balzer Sputter is located in the same room and can be used to cover samples (for instance polymer samples from the Polymer Injection Molding tool) with a thin gold layer before SEM inspection.

The SEM LEO was installed in the cleanroom in the 1998, and the software was ungraded in 2012.

The user manual, control instruction, the user APV and contact information can be found in LabManager:

SEM Supra 1 info page in LabManager,

Equipment performance

Equipment		SEM Supra 3 (Supra 40VP SEM)
Purpose	Imaging and measurement of	Any sample except bulk insulators such as polymers, glass or quartz wafers
Location		Cleanroom of DTU Danchip
Performance	Resolution	1-2 nm (limited by vibrations) The resolution is strongly dependent on the type of sample and the skills of the operator.
Instrument specifics	Detectors	Secondary electron (Se2) Inlens secondary electron (Inlens) High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB) Variable pressure secondary electron (VPSE)
	Stage	X, Y: 130 × 130 mm T: -4 to 70o R: 360o Z: 50 mm
	Electron source	FEG (Field Emission Gun) source
	Operating pressures	Fixed at High vacuum (2 × 10-4mbar - 10-6mbar) Variable at Low vacuum (0.1 mbar - 2 mbar)
	Options	High Definition four quadrant Angular Selective Backscattered electron detector (HDAsB)
Substrates	Batch size	Up to 6" wafer with full view
	Allowed materials	Any standard cleanroom material