Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy
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Scanning electron microscopy at Danchip
The SEM's at Danchip cover a wide range of needs both in the cleanroom and outside: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. They are all manufactured by Carl Zeiss and have the same graphical user interface.
At the turn of the year 2015-2016 we made a reorganisation of the SEM's at Danchip. The old workhorse SEM's (the Leo and Zeiss) that have excellently served the users of the cleanroom for many years will be given new roles.
- The Leo SEM is a very reliable and rugged instrument that provides high quality images of most samples. It is exclusively dedicated to the users of the Raith E-beam lithography system so general imaging of user samples is no longer allowed.
- The SEM Supra 1 (formerly known as SEM Zeiss) has been relocated to the basement with two purposes: Serving the users that have samples from outside the cleanroom and serving as training tool; all new SEM users with no/little SEM experience must be trained on this tool and gain basic knowledge (typically 10 hours of usage) here before being qualified for training on other SEM's.
The two remaining SEM's at Danchip (called SEM Supra 2 and SEM Supra 3) serve as general imaging tools in the cleanroom. Like Supra 1, they are VP models from Carl Zeiss and will produce excellent images on any sample. The possibility of operating at higher chamber pressures in the VP mode makes imaging of bulk non-conducting samples possible. The SEM Supra 2 is also equipped with an airlock and an EDX detector.
The user manuals, quality control procedures and results, user APVs, technical information and contact information can be found in LabManager:
SEM's at DTU Danchip:
- The SEM Leo page in LabManager,
- The SEM Supra 1 page in LabManager,
- The SEM Supra 2 page in LabManager,
- The SEM Supra 3 page in LabManager,
SEM's at DTU-Cen:
- The Dual beam FEI Helios Nanolab 600 page in LabManager,
- The SEM FEI Nova NanoSEM 600 page in LabManager,
Common challenges in scanning electron microscopy
| Equipment | SEM Leo | SEM Zeiss | SEM Supra 60VP | SEM Jeol | FEI Quanta 200 3D | |
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| Model | Leo 1550 SEM | Zeiss Supra 40 VP | Zeiss Supra 60 VP | Jeol JSM 5500 LV | FEI Quanta 200 3D | |
| Purpose | Imaging and measurement of |
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| Performance | Resolution | The resolution of a SEM is strongly dependent on the type of sample and the skills of the operator. The highest resolution is probably only achieved on special samples | ||||
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| Instrument specifics | Detectors |
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| Substrates | Sample sizes |
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