Specific Process Knowledge/Thin film deposition/Deposition of Aluminium Nitride
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Deposition of Aluminium Nitride
AlN can be deposited by using sputtering method with AlN target or reactive sputtering method with Al target in mixtures of argon and nitrogen. AlN film can be deposited by using the Cryofox PVD co-sputter/evaporation) or the Lesker Sputter System.
Only one method at the moment
Cryofox PVD co-sputter/evaporation | |
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Generel description |
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Stoichiometry |
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Film Thickness |
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Deposition rate |
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Step coverage |
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Process Temperature |
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Substrate size |
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Allowed materials |
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