Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD02

From LabAdviser
< Specific Process Knowledge‎ | Etch‎ | DRIE-Pegasus‎ | showerheadchange
Revision as of 15:22, 16 January 2015 by Jmli (talk | contribs) (Created page with " {| border="2" cellpadding="0" cellspacing="0" style="text-align:center;" |+ '''Process runs''' |- ! rowspan="2" width="40"| Date ! colspan="4" width="120"| Substrate Informat...")
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Process runs
Date Substrate Information Process Information SEM Images
Wafer info Mask Material/ Exposed area Tool / Operator Conditioning Recipe Wafer ID Comments
2/12-2014 4" Wafer with travka50 mask AZ standard Si / 50+ % Pegasus/jmli 10 minute TDESC clean danchip/jml/showerhead/prD/PrD01, 110 cyc or 6:14 mins S004691 New showerhead
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD02&oldid=17862"