Specific Process Knowledge/Wafer and sample drying

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Drying Comparison Table

Equipment		Spin dryer 1	Spin dryer 2	Spin dryer 3	Spin dryer 4	Critical point dryer	Ethanol fume dryer	N2\sub guns
Location		C-1	B-1	D-3	E-5	D-3	C-1
Purpose		Drying	Drying	Drying	Drying Rinsing + drying	Drying sensitive samples. E.g. with cantilevers	Drying sensitive samples. E.g. with cantilevers
Substrates	Batch size	1-25 100 mm wafers	1-25 100 mm wafers	1-25 100 mm wafers 1-25 150 mm wafers	? 50 mm wafers 1-25 100 mm wafers 1-25 150 mm wafers	1 to 5 wafers per run. Sizes: 2”, 4" or 6" Pieces (up to 10x10mm)	1-25 50 mm wafers 1-25 100 mm wafers Pieces if a suitable carrier is available
	Allowed materials	No restrictions	Only for RCA cleaned wafers	No restrictions	No restrictions	Si,SiO2, Si3N4 Quartz and Pyrex InAlP, GaAs SU8	No restriction except for polymers

Choose a drying equipment

• Critical Point Dryer
• Spin Dryers