Specific Process Knowledge/Lithography/mrEBL6000
| Resist | Polarity | Manufacturer | Comments | Technical reports | Spinner | Developer | Rinse | Remover | Process flows (in docx-format) |
| mr EBL 6000 | Positive | MicroResist | Standard negative resist | mrEBL6000 processing Guidelines.pdf | Manual Spinner 1 (Laurell), Spin Coater Labspin | mr DEV | IPA | Process_Flow_mrEBL6000.docx |
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers.
| MicroResist mr EBL 6000 spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 14-07-2014. Softbake 3 min @ 110 degC. | ||||||
|---|---|---|---|---|---|---|
| Spin Speed [rpm] | Acceleration [1/s2] | Thickness [nm] | St Dev | |||
| 2000 | 2000 | |||||
| 3000 | 2000 | |||||
| 4000 | 2000 | |||||
| 5000 | 2000 | |||||
| 6000 | 2000 | |||||