Specific Process Knowledge/Thin film deposition/Deposition of Germanium
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Deposition of Germanium
Germanium can be deposited by thermal evaporation.
Thermal evaporation (Wordentec) | Thermal evaporation (Physimeca) | |
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Batch size |
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Pre-clean | RF Ar clean | - |
Layer thickness | 10Å to about 2000Å | 10Å to about 3000Å |
Deposition rate | From 0.4 Å/s up to about ~2Å/s | From 5 Å/s up to 10/s |
Allowed substrates |
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Allowed materials |
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Comment | Recommended for unexposed e-beam resist |