Specific Process Knowledge/Etch/Etching of Chromium
Etching of Chromium
Etching of chromium is done wet at Danchip. We have two solution for this:
- HNOFailed to parse (SVG (MathML can be enabled via browser plugin): Invalid response ("Math extension cannot connect to Restbase.") from server "https://wikimedia.org/api/rest_v1/":): {\displaystyle _3} :HFailed to parse (SVG (MathML can be enabled via browser plugin): Invalid response ("Math extension cannot connect to Restbase.") from server "https://wikimedia.org/api/rest_v1/":): {\displaystyle _2} O:cerisulphate - 90ml:1200ml:15g
- Commercial chromium etch
Etch rate 400-1000 Å/min (depending on the level of oxidation of the metal)
| Chromium etch 1 | Chromium etch 2 | |
|---|---|---|
| General description |
Etch of chromium |
Etch of chronium |
| Chemical solution | HNOFailed to parse (SVG (MathML can be enabled via browser plugin): Invalid response ("Math extension cannot connect to Restbase.") from server "https://wikimedia.org/api/rest_v1/":): {\displaystyle _3} :HFailed to parse (SVG (MathML can be enabled via browser plugin): Invalid response ("Math extension cannot connect to Restbase.") from server "https://wikimedia.org/api/rest_v1/":): {\displaystyle _2} O:cerisulphate - 90ml:1200ml:15g | Commercial chromium etch
CE 8002-A |
| Process temperature | Room temperature | Room temperature |
| Possible masking materials: |
Photoresist (1.5 µm AZ5214E) |
Photoresist (1.5 µm AZ5214E) |
| Etch rate |
~40-100 nm/min |
~10-20 nm/min |
| Batch size |
1-25 wafers at a time |
1-25 wafer at a time |
| Size of substrate |
4" wafers |
4" wafers |
| Allowed materials |
|
|