Feedback to this page: click here
Polisher/Lapper
The Logitech PM5 Polisher/Lapper is for thinning down wafers and other substrates.
The user manual, user APV(s), technical information and contact information can be found in LabManager:
The Logitech PM5 Polisher/Lapper in LabManager
Equipment performance and process related parameters
Equipment
|
Polisher/Lapper
|
Equipment 2
|
Purpose
|
Thinning of substrates of
|
- InP
- GaAs
- Silicon
- Metals
- Glass/Quartz
|
- Purpose 1
- Purpose 2
- Purpose 3
|
Performance
|
Thinning
|
- Removal rate: 1-10µm/min
- Thickness accuracy: +/- 10 µm
- Thickness homogeneity: +/- 10 µm
- Roughness: +/- ? µm
|
- Performance range 1
- Performance range 2
- Performance range 3
|
Polishing
|
- Removal rate: ~1 µm/min
- Thickness accuracy: ? µm
- Thickness homogeneity: ? µm
- Roughness: +/- ? µm
|
|
Process parameter range
|
Polishing liquid
|
- Al2O3 (alumina) powder: 3, 9 or 20 µm
- Chemlox (for polishing)
|
|
Rotation speed
|
- Thinning: 5-20 rpm
- Polishing: 5-80 rpm
|
|
Arm sweep
|
- Thinning: stationary
- Polishing: 12% (inner) - 80% (outer)
|
|
Substrates
|
Batch size
|
- # small samples
- # 50 mm wafers
- # 100 mm wafers
|
- # small samples
- # 50 mm wafers
- # 100 mm wafers
- # 150 mm wafers
|
Allowed materials
|
- InP
- GaAs
- Silicon
- Metals
- Glass/Quartz
|
- Allowed material 1
- Allowed material 2
- Allowed material 3
|