Specific Process Knowledge/Lithography/UVLithography

From LabAdviser
< Specific Process Knowledge‎ | Lithography
Revision as of 14:30, 30 May 2013 by Tigre (talk | contribs) (Created page with " {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" |- |- |-style="background:silver; color:black" ![[Specific Process Knowledge/Thin film deposition/Furn...")
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Process Resist Type Comment 1 Comment 2 Comment 3
Lift off NLOF AA BB CC
Dry Etch DD
  • DD1
  • DD2
 EE FF GG
Wet Etch HH
  • HH1
  • HH2
 II JJ KK



Resist Comments Pre-treatment Resist Coating Exposure Baking Developing Stripping, Lift-off
AA AA AA AA AA AA AA AA
BB BB BB BB BB BB BB BB
CC CC CC CC CC CC CC CC


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/UVLithography&oldid=10021"