A rough overview of the performance of the FilmTek and some process related parameters
Purpose
Film thickness measurements and optical characterization of optically transparent thin films
Measurement of (multi layer) film thickness (only one unknown layer)
Optical constants
Surface roughness
Performance
Thin film materials that can be measured
Any film that is transparent to the light in the given wavelength range
ex:
Silicon Oxide
Silicon nitride
PolySilicon
Photoresists
SU8
Other polymers
Very thin layers of metals (<20 nm)
and many more
.
Film thickness range
<100 Å to 250 µm (depending of the material)
Process parameter range
Wavelength range
400-1000 nm
Substrates
Batch size
One sample at a time - all sample larger than 5x5 mm2sizes up to 6"
.
Substrate material allowed
In principle all materials
Only pure silicon, silicon oxides, silicon nitrides and quartz may be in direct contact with the surface of the stage. If you have metals, III-V materials or polymers on the back side of the substrate the please mount your sample on a silicon carrier wafer.
