Specific Process Knowledge/Etch/Etching of Aluminium
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Revision as of 14:03, 12 March 2013 by BGE (talk | contribs) (→Comparison methode 1 and methode 2 for the process)
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Etching of Aluminium
Etching of aluminium can be done either by wet etch, dry etch or by sputtering with ions.
Comparison of Aluminium etch metodes
Al wet etch 1 | Al wet etch 2 | Al etch by ICP metal | Al sputtering by IBE (Ionfab300+) | |
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Generel description | Wet etch of pure Al | Wet etch of Al + 1.5% Si | Dry plasma etch of Al | Sputtering of Al - pure physical etch |
Etch rate range |
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Etch profile |
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Substrate size |
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Smaller pieces glued to carrier wafer
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Allowed materials |
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